Invention Grant
- Patent Title: Template derivative for forming ultra-low dielectric layer and method of forming ultra-low dielectric layer using the same
- Patent Title (中): 用于形成超低介电层的模板衍生物和使用其形成超低介电层的方法
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Application No.: US11964950Application Date: 2007-12-27
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Publication No.: US08202807B2Publication Date: 2012-06-19
- Inventor: Sung Kyu Min , Ja Chun Ku , Chan Bae Kim , Sang Tae Ahn , Chai O Chung , Hyeon Ju An , Hyo Seok Lee , Eun Jeong Kim
- Applicant: Sung Kyu Min , Ja Chun Ku , Chan Bae Kim , Sang Tae Ahn , Chai O Chung , Hyeon Ju An , Hyo Seok Lee , Eun Jeong Kim
- Applicant Address: KR Kyoungki-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Kyoungki-do
- Agency: Ladas & Parry LLP
- Priority: KR10-2006-0135737 20061227; KR10-2007-0042106 20070430
- Main IPC: H01L21/31
- IPC: H01L21/31
Abstract:
A reactive cyclodextrin derivative or a reactive glucose derivative is used as a template derivative for forming an ultra-low dielectric layer. A layer is formed of the reactive cyclodextrin derivative or the reactive glucose derivative capped with Si—H and then cured in an atmosphere of hydrogen peroxide to form the ultra-low dielectric layer.
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