Invention Grant
- Patent Title: Polishing apparatus and program thereof
- Patent Title (中): 抛光装置及其程序
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Application No.: US12596333Application Date: 2008-04-17
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Publication No.: US08206197B2Publication Date: 2012-06-26
- Inventor: Hidetaka Nakao , Masafumi Inoue , Koichi Takeda
- Applicant: Hidetaka Nakao , Masafumi Inoue , Koichi Takeda
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2007-111848 20070420
- International Application: PCT/JP2008/057881 WO 20080417
- International Announcement: WO2008/133286 WO 20081106
- Main IPC: B24B49/00
- IPC: B24B49/00 ; B24B1/00

Abstract:
A polishing apparatus includes a loading section (14) for placing therein a cassette (12) in which a plurality of polishing objects are housed; a first polishing line (20) and a second polishing line (30) for polishing a polishing object; a cleaning line (40) having cleaning machines (42a, 42b, 42c, 42d) for cleaning the polishing object after polishing and a transport unit (44) for transporting the polishing object; a transport mechanism (50) for transporting the polishing object between the loading section (14), the polishing lines (20, 30) and the cleaning line (40); and a control section for controlling the polishing lines (20, 30), the cleaning line (40) and the transport mechanism (50). The control section determines a polishing start time in each of the first and second polishing lines (20, 30) based on a predicted polishing time in each of the first and second polishing lines (20, 30), a predicted transport time in the transport mechanism (50), a predicted cleaning time in the cleaning line (40) and a predicted cleaning start time to start cleaning by driving the transport unit (44) of the cleaning line (40).
Public/Granted literature
- US20100130103A1 POLISHING APPARATUS AND PROGRAM THEREOF Public/Granted day:2010-05-27
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