发明授权
- 专利标题： Forming solar cells using a patterned deposition process
- 专利标题（中）： 使用图案化沉积工艺形成太阳能电池
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申请号： US13042313申请日： 2011-03-07
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公开(公告)号： US08207005B2公开(公告)日： 2012-06-26
- 发明人: Timothy W. Weidman , Rohit Mishra , Michael P. Stewart , Kapila P. Wijekoon , Yonghwa Chris Cha , Tristan Holtam , Vinay Shah
- 申请人： Timothy W. Weidman , Rohit Mishra , Michael P. Stewart , Kapila P. Wijekoon , Yonghwa Chris Cha , Tristan Holtam , Vinay Shah
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan, LLP
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/76 ; H01L21/331 ; H01L21/20 ; H01L33/00
摘要：
Embodiments of the invention contemplate the formation of a high efficiency solar cell using novel methods to form the active doped region(s) and the metal contact structure of the solar cell device. In one embodiment, the methods include the steps of depositing a dielectric material that is used to define the boundaries of the active regions and/or contact structure of a solar cell device. Various techniques may be used to form the active regions of the solar cell and the metal contact structure.
公开/授权文献
- US20110183458A1 FORMING SOLAR CELLS USING A PATTERNED DEPOSITION PROCESS 公开/授权日：2011-07-28