发明授权
- 专利标题： Exposure method, substrate stage, exposure apparatus, and device manufacturing method
- 专利标题（中）： 曝光方法，基材台，曝光装置和装置制造方法
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申请号： US12232063申请日： 2008-09-10
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公开(公告)号： US08208117B2公开(公告)日： 2012-06-26
- 发明人: Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
- 申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2003-169904 20030613; JP2003-383887 20031113; JP2004-039654 20040217
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42 ; G03B27/58 ; G03B27/54 ; G03B27/60
摘要：
An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
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