Invention Grant
- Patent Title: Substrate provided with a dressing
- Patent Title (中): 底物配有敷料
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Application No.: US10579472Application Date: 2004-11-15
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Publication No.: US08211529B2Publication Date: 2012-07-03
- Inventor: Philipp Schaefer
- Applicant: Philipp Schaefer
- Applicant Address: DE Ludwigshafen
- Assignee: BASF Aktiengesellschaft
- Current Assignee: BASF Aktiengesellschaft
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: DE20317670U 20031115; ATGM830/2003 20031124; ATGM918/2003 20031222; ATA340/2004 20040302; ATGM404/2004 20040607; ATGM491/2004 20040713
- International Application: PCT/IB2004/003986 WO 20041115
- International Announcement: WO2005/047549 WO 20050526
- Main IPC: B32B3/24
- IPC: B32B3/24 ; D06N3/14

Abstract:
To endow a velourlike carrier (7), which has a finely fibrous surface, in particular a grain leather having a buffed topside or a synthetic velour material, and has been provided with a dressing (1) which has a grain texture on its face side the dressing (1) consisting of a consolidated polymeric dispersion and being produced separately on a substrate having a textured surface corresponding to the grain texture, with the requisite properties in terms of softness and abrasion resistance, but particularly in terms of air and water vapor permeability, the dressing (1) has capillaries (11) which extend throughout its entire thickness, which everywhere is substantially the same, and is bonded to the carrier (7) via a thin bonding layer (12) formed of a consolidated polymeric dispersion.
Public/Granted literature
- US20070082176A1 Substrate provided with a dressing Public/Granted day:2007-04-12
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