发明授权
- 专利标题: Polycrystalline silicon solar cell having high efficiency and method for fabricating the same
- 专利标题(中): 具有高效率的多晶硅太阳能电池及其制造方法
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申请号: US12355078申请日: 2009-01-16
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公开(公告)号: US08211738B2公开(公告)日: 2012-07-03
- 发明人: Seung Ki Joo , Hyeong Suk Yoo , Young Su Kim
- 申请人: Seung Ki Joo , Hyeong Suk Yoo , Young Su Kim
- 申请人地址: KR Seoul
- 专利权人: SNU R&DB Foundation
- 当前专利权人: SNU R&DB Foundation
- 当前专利权人地址: KR Seoul
- 代理机构: Rosenberg, Klein & Lee
- 优先权: KR10-2008-0004835 20080116
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
Disclosed herein is a method of forming a light-absorbing layer of a polycrystalline silicon solar cell, including: forming a polycrystalline silicon layer on a back electrode; forming an intrinsic amorphous silicon layer on the polycrystalline silicon layer; and heat-treating the transparent insulating substrate to vertically crystallize the intrinsic amorphous silicon layer using the polycrystalline silicon layer as a seed for crystallization through a metal induced vertical crystallization (MIVC) process to form the intrinsic amorphous silicon layer into a light-absorbing layer made of polycrystalline silicon, and is a method of fabricating a high-efficiency polycrystalline silicon solar cell using the light-absorbing layer.
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