Invention Grant
- Patent Title: Resistance changing device and method for fabricating the same
- Patent Title (中): 电阻变化装置及其制造方法
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Application No.: US12697507Application Date: 2010-02-01
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Publication No.: US08212232B2Publication Date: 2012-07-03
- Inventor: Yu-Jin Lee
- Applicant: Yu-Jin Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2009-0101296 20091023
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
A resistance changing device includes a resistive layer of a hetero structure interposed between a lower electrode and an upper electrode, and including a plurality of resistive material layers, each having a different resistivity, stacked therein, wherein resistivities of the resistive material layers decrease from the lower electrode toward the upper electrode. Since the resistive layer has a hetero structure in which a plurality of resistive material layers, each having a different resistivity, are stacked in such a manner that the resistivity decreases as it goes from the lower electrode to the upper electrode, it is possible to improve the distributions of the set/reset voltage and the set/reset current, while reducing a reset current of a resistance changing device at the same time.
Public/Granted literature
- US20110095259A1 RESISTANCE CHANGING DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2011-04-28
Information query
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