发明授权
- 专利标题: Forming and training processes for resistance-change memory cell
- 专利标题(中): 电阻变化记忆体的形成和训练过程
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申请号: US12842810申请日: 2010-07-23
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公开(公告)号: US08216862B2公开(公告)日: 2012-07-10
- 发明人: Franz Kreupl , Deepak C. Sekar
- 申请人: Franz Kreupl , Deepak C. Sekar
- 申请人地址: US CA Milpitas
- 专利权人: SanDisk 3D LLC
- 当前专利权人: SanDisk 3D LLC
- 当前专利权人地址: US CA Milpitas
- 代理机构: Vierra Magen Marcus & DeNiro LLP
- 主分类号: H01L21/06
- IPC分类号: H01L21/06
摘要:
During the manufacture of a set of non-volatile resistance-switching memory elements, a forming process is performed in which a voltage is applied over forming period until a conductive filament is formed in a resistance-switching layer. A heat source at a temperature of 50° C. to 150° C. is applied to expedite the forming process while reducing the required magnitude of the applied voltage. Manufacturing time and reliability are improved. After the forming process, an expedited training process can be performed in which a fixed number of cycles of voltage pulses are applied without verifying the memory elements. Subsequently, the memory elements are verified by determining their read current in an evaluation. Another fixed number of cycles of voltage pulses is applied without verifying the memory elements, if the memory elements do not pass the evaluation.
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