发明授权
US08217347B2 System and method for detecting at least one contamination species in a lithographic apparatus
失效
用于检测光刻设备中的至少一种污染物质的系统和方法
- 专利标题： System and method for detecting at least one contamination species in a lithographic apparatus
- 专利标题（中）： 用于检测光刻设备中的至少一种污染物质的系统和方法
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申请号： US13021226申请日： 2011-02-04
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公开(公告)号： US08217347B2公开(公告)日： 2012-07-10
- 发明人: Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Ralph Kurt , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Peter Cornelis Zalm
- 申请人： Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Ralph Kurt , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Peter Cornelis Zalm
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G01N23/00
- IPC分类号： G01N23/00
摘要：
A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
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