发明授权
US08221550B2 Process and apparatus for producing a single crystal of semiconductor material 有权
用于制造半导体材料的单晶的工艺和设备

  • 专利标题: Process and apparatus for producing a single crystal of semiconductor material
  • 专利标题(中): 用于制造半导体材料的单晶的工艺和设备
  • 申请号: US12640755
    申请日: 2009-12-17
  • 公开(公告)号: US08221550B2
    公开(公告)日: 2012-07-17
  • 发明人: Wilfried von Ammon
  • 申请人: Wilfried von Ammon
  • 申请人地址: DE Munich
  • 专利权人: Siltronic AG
  • 当前专利权人: Siltronic AG
  • 当前专利权人地址: DE Munich
  • 代理机构: Brooks Kushman P.C.
  • 主分类号: C30B35/00
  • IPC分类号: C30B35/00
Process and apparatus for producing a single crystal of semiconductor material
摘要:
A process for producing a single crystal of semiconductor material, in which fractions of a melt, are kept in liquid form by a pulling coil, solidify on a seed crystal to form the growing single crystal, and granules are melted in order to maintain the growth of the single crystal. The melting granules are passed to the melt after a delay. There is also an apparatus which Is suitable for carrying out the process and has a device which delays mixing of the molten granules and of the melt.
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