Invention Grant
- Patent Title: Reactor, plant and industrial process for the continuous preparation of high-purity silicon tetrachloride or high-purity germanium tetrachloride
- Patent Title (中): 反应器,工厂和工业过程中连续制备高纯四氯化硅或高纯度四氯化锗
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Application No.: US12065126Application Date: 2006-06-06
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Publication No.: US08221593B2Publication Date: 2012-07-17
- Inventor: Juergen Erwin Lang , Rainer Nicolai , Hartwig Rauleder
- Applicant: Juergen Erwin Lang , Rainer Nicolai , Hartwig Rauleder
- Applicant Address: DE Essen
- Assignee: Evonik Degussa GmbH
- Current Assignee: Evonik Degussa GmbH
- Current Assignee Address: DE Essen
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: DE102005041137 20050830
- International Application: PCT/EP2006/062916 WO 20060606
- International Announcement: WO2007/025787 WO 20070308
- Main IPC: H05F3/04
- IPC: H05F3/04

Abstract:
A reactor, a plant, and a continuous, industrial process carried out therein for preparing high-purity silicon tetrachloride or high-purity germanium tetrachloride by treating the silicon tetrachloride or germanium tetrachloride to be purified, which is contaminated by at least one hydrogen-containing compound, by a cold plasma and isolating purified high-purity silicon tetrachloride or germanium tetrachloride from the resulting treated phase by fractional distillation. The treatment is carried out in a plasma reactor in which longitudinal axes of a dielectric, of a high-voltage electrode, and of a grounded, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the force vector of gravity.
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