发明授权
- 专利标题: Method of manufacturing multibit electro-mechanical memory device having movable electrode
- 专利标题(中): 具有可动电极的多位机电存储器件的制造方法
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申请号: US13116374申请日: 2011-05-26
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公开(公告)号: US08222067B2公开(公告)日: 2012-07-17
- 发明人: Eun-Jung Yun , Min-Sang Kim , Sung-Min Kim , Sung-Young Lee , Ji-Myoung Lee , In-Hyuk Choi
- 申请人: Eun-Jung Yun , Min-Sang Kim , Sung-Min Kim , Sung-Young Lee , Ji-Myoung Lee , In-Hyuk Choi
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Onello & Mello, LLP
- 优先权: KR10-2007-0050223 20070523
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L29/66 ; H01L29/84
摘要:
A multibit electro-mechanical memory device comprises a substrate, a bit line on the substrate, a first interlayer insulating film on the bit line, first and second lower word lines on the first interlayer insulating film, the first and second lower word lines separated horizontally from each other by a trench, a spacer abutting a sidewall of each of the first and second lower word lines, a pad electrode inside a contact hole, first and second cantilever electrodes suspended over first and second lower voids that correspond to upper parts of the first and second lower word lines provided in both sides on the pad electrode, the first and second cantilever electrodes being separated from each other by the trench, and being curved in a third direction that is perpendicular to the first and second direction; a second interlayer insulating film on the pad electrode, first and second trap sites supported by the second interlayer insulating film to have first and second upper voids on the first and second cantilever electrodes, and first and second upper word lines on the first and second trap sites.
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