发明授权
US08227169B2 Compound, acid generator, resist composition, and method of forming resist pattern
有权
化合物，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
- 专利标题： Compound, acid generator, resist composition, and method of forming resist pattern
- 专利标题（中）： 化合物，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
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申请号： US12450060申请日： 2008-04-04
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公开(公告)号： US08227169B2公开(公告)日： 2012-07-24
- 发明人: Akiya Kawaue , Yoshiyuki Utsumi , Takehito Seo , Hideo Hada , Kotaro Endo , Daisuke Kawana , Yasuhiro Yoshii , Tsuyoshi Kurosawa
- 申请人： Akiya Kawaue , Yoshiyuki Utsumi , Takehito Seo , Hideo Hada , Kotaro Endo , Daisuke Kawana , Yasuhiro Yoshii , Tsuyoshi Kurosawa
- 申请人地址： JP Kanagawa
- 专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址： JP Kanagawa
- 代理机构： Wenderoth, Lind & Ponack, L.L.P.
- 优先权： JPP2007-108453 20070417; JPP2007-150586 20070606; JPP2007-275654 20071023
- 国际申请： PCT/JP2008/056780 WO 20080404
- 国际公布： WO2008/132966 WO 20081106
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30 ; C07C309/06
摘要：
There are provided a compound preferable as an acid generator for a resist composition, an acid generator including the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition, and the compound is represented by general formula (b1-12) shown below: R2—CH2—O—Y1—SO3−A+ (b1-12) wherein R2 represents a monovalent aromatic organic group; Y1 represents an alkylene group of 1 to 4 carbon atoms which may be fluorinated; and A+ represents a cation.
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