发明授权
- 专利标题： Exposing device, methods for forming pattern, channel, and hole by using the same, and liquid crystal display device therewith and method for fabricating the same
- 专利标题（中）： 曝光装置，通过使用它们形成图案，通道和孔的方法，以及液晶显示装置及其制造方法
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申请号： US12256840申请日： 2008-10-23
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公开(公告)号： US08228455B2公开(公告)日： 2012-07-24
- 发明人: Joon Young Yang , Jung Il Lee , Jeong Oh Kim , Yu Kyeong Ahn , Young Kwon Kang , Sang Jin Lee , Jung Ho Bang
- 申请人： Joon Young Yang , Jung Il Lee , Jeong Oh Kim , Yu Kyeong Ahn , Young Kwon Kang , Sang Jin Lee , Jung Ho Bang
- 申请人地址： KR Seoul
- 专利权人： LG Display Co., Ltd.
- 当前专利权人： LG Display Co., Ltd.
- 当前专利权人地址： KR Seoul
- 代理机构： Brinks Hofer Gilson & Lione
- 优先权： KR10-2007-0108674 20071029
- 主分类号： G02F1/136
- IPC分类号： G02F1/136 ; G02F1/13 ; G03F1/00 ; G03F7/00
摘要：
The present invention relates a method for forming a pattern includes the steps of forming a thin film on a substrate, coating a photoresist film on the thin film, aligning a mask over the photoresist film, the mask formed on a base material, including a light shielding portion having a linear supporting portion and an uneven portion at a boundary of the supporting portion, and a transmission portion defined at regions excluding the light shielding portion, exposing the photoresist film with the mask thereon to a UV beam of a wavelength greater than 300nm to cause refraction in the vicinity of the uneven portion, and developing the photoresist film exposed thus to form a photoresist film pattern, and patterning the thin film by using the photoresist film pattern thus formed.
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