发明授权
- 专利标题: Method and apparatus for adjusting a substrate support
- 专利标题(中): 用于调整衬底支撑件的方法和装置
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申请号: US12983678申请日: 2011-01-03
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公开(公告)号: US08230783B2公开(公告)日: 2012-07-31
- 发明人: John G. Klauser , Ronald J. Forget
- 申请人: John G. Klauser , Ronald J. Forget
- 申请人地址: US IL Glenview
- 专利权人: Illinois Tool Works Inc.
- 当前专利权人: Illinois Tool Works Inc.
- 当前专利权人地址: US IL Glenview
- 代理机构: Lando & Anastasi, LLP
- 主分类号: B05C17/08
- IPC分类号: B05C17/08
摘要:
A stencil printer for printing viscous material on a substrate includes a frame, a stencil, and a print head to deposit and print viscous material over the stencil. A substrate support supports a substrate in a print position. A substrate support movement assembly includes a first movement mechanism configured to move the substrate support in a first direction, a second movement mechanism configured to move the substrate support in a second direction, the second direction being generally perpendicular to the first direction, and a third movement mechanism, spaced from a first movement mechanism, configured to move the substrate in the first direction. The stencil printer further includes a controller coupled to the substrate support movement assembly to move the substrate support by the first, second and third movement mechanisms in an x-direction, a y-direction and a rotational direction to align the substrate.
公开/授权文献
- US20110120325A1 METHOD AND APPARATUS FOR ADJUSTING A SUBSTRATE SUPPORT 公开/授权日:2011-05-26