发明授权
- 专利标题: Semiconductor wafers of silicon and method for their production
- 专利标题(中): 硅半导体晶圆及其生产方法
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申请号: US13225822申请日: 2011-09-06
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公开(公告)号: US08231725B2公开(公告)日: 2012-07-31
- 发明人: Andreas Sattler , Wilfried von Ammon , Martin Weber , Walter Haeckl , Herbert Schmidt
- 申请人: Andreas Sattler , Wilfried von Ammon , Martin Weber , Walter Haeckl , Herbert Schmidt
- 申请人地址: DE Munich
- 专利权人: Siltronic AG
- 当前专利权人: Siltronic AG
- 当前专利权人地址: DE Munich
- 代理机构: Brooks Kushman P.C.
- 优先权: DE102007005346 20070202
- 主分类号: C30B29/06
- IPC分类号: C30B29/06
摘要:
Semiconductor wafers of silicon are produced by pulling a single crystal growing on a phase boundary from a melt contained in a crucible and cutting of semiconductor wafers therefrom, wherein during pulling of the single crystal, heat is delivered to a center of the phase boundary and a radial profile of a ratio V/G from the center to an edge of the phase boundary is controlled, G being the temperature gradient perpendicular to the phase boundary and V being the pull rate. The radial profile of the ratio V/G is controlled so that the effect of thermomechanical stress in the single crystal adjoining the phase boundary, is compensated with respect to creation of intrinsic point defects. The invention also relates to defect-free semiconductor wafers of silicon, which can be produced economically by this method.
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