Invention Grant
- Patent Title: Illumination aperture for optical lithography
- Patent Title (中): 光学光刻照明光圈
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Application No.: US12319014Application Date: 2008-12-30
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Publication No.: US08233210B2Publication Date: 2012-07-31
- Inventor: Charles Wallace , Matthew Tingey , Swaminathan Sivakumar
- Applicant: Charles Wallace , Matthew Tingey , Swaminathan Sivakumar
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Winkle, PLLC
- Main IPC: G02B26/02
- IPC: G02B26/02 ; G03B27/54 ; G03B27/72
Abstract:
Embodiments of systems and methods for providing a hybrid illumination aperture in optical lithography are generally described herein. Other embodiments may be described and claimed.
Public/Granted literature
- US20100165317A1 Illumination aperture for optical lithography Public/Granted day:2010-07-01
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