Invention Grant
- Patent Title: Non-volatile semiconductor storage device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US12694690Application Date: 2010-01-27
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Publication No.: US08233323B2Publication Date: 2012-07-31
- Inventor: Tomoo Hishida , Yoshihisa Iwata , Kiyotaro Itagaki , Takashi Maeda
- Applicant: Tomoo Hishida , Yoshihisa Iwata , Kiyotaro Itagaki , Takashi Maeda
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neaustadt, L.L.P.
- Priority: JP2009-041157 20090224
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
A non-volatile semiconductor storage device includes a control circuit performing an erase operation to erase data from a selected one of memory transistors. The control circuit applies a first voltage to the other end of selected one of selection transistors, causes the selected one of the selection transistors to turn on, and causes any one of the memory transistors to turn on that is closer to the selection transistor than the selected one of the memory transistors. The control circuit also applies a second voltage lower than the first voltage to a gate of the selected one of the memory transistors. Such a potential difference between the first voltage and the second voltage causing a change in electric charges in the electric charge storage layer.
Public/Granted literature
- US20100214838A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2010-08-26
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