发明授权
US08236482B2 Photoresist compositions and methods of use in high index immersion lithography
失效
光刻胶组合物和高指数浸渍光刻中使用的方法
- 专利标题： Photoresist compositions and methods of use in high index immersion lithography
- 专利标题（中）： 光刻胶组合物和高指数浸渍光刻中使用的方法
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申请号： US12163649申请日： 2008-06-27
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公开(公告)号： US08236482B2公开(公告)日： 2012-08-07
- 发明人: Hiroshi Ito , Daniel Paul Sanders , Linda Karin Sundberg
- 申请人： Hiroshi Ito , Daniel Paul Sanders , Linda Karin Sundberg
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： CanaanLaw, P.C.
- 代理商 Karen Canaan
- 主分类号： G03C1/00
- IPC分类号： G03C1/00 ; G03F7/00 ; G03F1/00
摘要：
The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.