发明授权
- 专利标题： Copper contamination detection method and system for monitoring copper contamination
- 专利标题（中）： 铜污染检测方法和铜污染监测系统
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申请号： US12973062申请日： 2010-12-20
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公开(公告)号： US08236580B2公开(公告)日： 2012-08-07
- 发明人: Jay Sanford Burnham , Joseph Kerry Vaughn Comeau , Leslie Peter Crane , James Randall Elliott , Scott Alan Estes , James Spiros Nakos , Eric Jeffrey White
- 申请人： Jay Sanford Burnham , Joseph Kerry Vaughn Comeau , Leslie Peter Crane , James Randall Elliott , Scott Alan Estes , James Spiros Nakos , Eric Jeffrey White
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Schmeiser, Olsen & Watts
- 代理商 David A. Cain
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
A method of monitoring copper contamination. The method includes method, comprising: (a) ion-implanting an N-type dopant into a region of single-crystal silicon substrate, the region abutting a top surface of the substrate; (c) activating the N-type dopant by annealing the substrate at a temperature of 500° C. or higher in an inert atmosphere; (c) submerging, for a present duration of time, the substrate into an aqueous solution, the aqueous solution to be monitored for copper contamination; and (d) determining an amount of copper adsorbed from the aqueous solution by the region of the substrate.