Invention Grant
- Patent Title: Method for producing a hole
- Patent Title (中): 孔的制造方法
-
Application No.: US12223204Application Date: 2007-01-05
-
Publication No.: US08237082B2Publication Date: 2012-08-07
- Inventor: Thomas Beck , Silke Settegast
- Applicant: Thomas Beck , Silke Settegast
- Applicant Address: DE München
- Assignee: Siemens Aktiengesellschaft
- Current Assignee: Siemens Aktiengesellschaft
- Current Assignee Address: DE München
- Priority: EP06001467 20060124
- International Application: PCT/EP2007/050101 WO 20070105
- International Announcement: WO2007/085516 WO 20070802
- Main IPC: B23K26/38
- IPC: B23K26/38

Abstract:
There is described a method for producing a hole using e.g. a lasers, wherein short laser pulse durations are used. The laser pulse durations are varied, short laser pulse durations being utilized only in the area to be removed in which an influence on the penetration behavior and discharge behavior is noticeable while longer pulse durations of >0.4 ms are used. This is the case for the inner surface of a diffuser of a hole, for example, which can be produced very accurately by means of short laser pulse durations.
Public/Granted literature
- US20120091106A9 Method For Producing A Hole Public/Granted day:2012-04-19
Information query
IPC分类: