发明授权
- 专利标题: Method of manufacturing liquid crystal device
- 专利标题(中): 制造液晶装置的方法
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申请号: US12498641申请日: 2009-07-07
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公开(公告)号: US08243249B2公开(公告)日: 2012-08-14
- 发明人: Shintaro Asuke
- 申请人: Shintaro Asuke
- 申请人地址: JP
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: JP2008-180393 20080710
- 主分类号: G02F1/13
- IPC分类号: G02F1/13 ; G02F1/1337
摘要:
A method of manufacturing a liquid crystal device provided with a liquid crystal layer held between a pair of substrates opposed to each other, and an oriented film disposed between at least one of the substrates and the liquid crystal layer, includes: (a) providing an inorganic oriented film to the one of the substrates; (b) forming a first organic film with a first silane-coupling agent, the first organic film randomly covering a surface of the inorganic oriented film with a predetermined coverage factor smaller than 1; and (c) forming, after step (b), a second organic film with a second silane-coupling agent having a carbon number different from a carbon number of the first silane-coupling agent, the second organic film covering the surface exposed from the first organic film, thereby forming the oriented film composed mainly of the first organic film, the second organic film, and the inorganic film.
公开/授权文献
- US20100006538A1 METHOD OF MANUFACTURING LIQUID CRYSTAL DEVICE 公开/授权日:2010-01-14
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