Invention Grant
- Patent Title: Optical inspection method and optical inspection apparatus
- Patent Title (中): 光学检测方法和光学检测仪器
-
Application No.: US13167298Application Date: 2011-06-23
-
Publication No.: US08243263B2Publication Date: 2012-08-14
- Inventor: Shigeru Matsui
- Applicant: Shigeru Matsui
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-180632 20060630
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
In the conventional contaminant particle/defect inspection method, if the illuminance of the illumination beam is held at not more than a predetermined upper limit value not to give thermal damage to the sample, the detection sensitivity and the inspection speed being in the tradeoff relation with each other, it is very difficult to improve one of the detection sensitivity and the inspection speed without sacrificing the other or improve both at the same time. The invention provides an improved optical inspection method and an improved optical inspection apparatus, in which a pulse laser is used as a light source, and a laser beam flux is split into a plurality of laser beam fluxes which are given different time delay to form a plurality of illumination spots. The scattered light signal from each illumination spot is isolated and detected by using a light emission start timing signal for each illumination spot.
Public/Granted literature
- US20110255082A1 OPTICAL INSPECTION METHOD AND OPTICAL INSPECTION APPARATUS Public/Granted day:2011-10-20
Information query