Invention Grant
- Patent Title: Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
- Patent Title (中): 流体过滤法，流体过滤器，光刻设备和器件制造方法
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Application No.: US13029828Application Date: 2011-02-17
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Publication No.: US08246838B2Publication Date: 2012-08-21
- Inventor: Martinus Cornelis Maria Verhagen , Roelof Frederik De Graaf , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Marco Koert Stavenga , Jacobus Johannus Leonardus Hendricus Verspay
- Applicant: Martinus Cornelis Maria Verhagen , Roelof Frederik De Graaf , Johannes Henricus Wilhelmus Jacobs , Hans Jansen , Marco Koert Stavenga , Jacobus Johannus Leonardus Hendricus Verspay
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Phillsbury Winthrop Shaw Pittmann LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; B01D37/00
Abstract:
A method for filtering a fluid to obtain a fluid having a known purity is described. The fluid is filtered with a filtration system, and upstream of a final filtration stage of the filtration system, a purity of the fluid is measured. A purity of the fluid filtered by the filtration system is determined by correcting the measured purity with a filtration behavior of the final filtration stage. In an embodiment, the fluid comprises an ultra pure water for use as an immersion liquid in a lithographic apparatus.
Public/Granted literature
- US20110136064A1 FLUID FILTRATION METHOD, FLUID FILTERED THEREBY, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACUTRING METHOD Public/Granted day:2011-06-09
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