发明授权
- 专利标题： Optofluidic lithography system, method of manufacturing two-layered microfluidic channel, and method of manufacturing three-dimensional microstructures
- 专利标题（中）： 光电光刻系统，双层微流体通道的制造方法和制造三维微结构的方法
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申请号： US12555428申请日： 2009-09-08
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公开(公告)号： US08246889B2公开(公告)日： 2012-08-21
- 发明人: Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
- 申请人： Sunghoon Kwon , SeungAh Lee , Wook Park , SuEun Chung
- 申请人地址： KR Seoul
- 专利权人： SNU R&DB Foundation
- 当前专利权人： SNU R&DB Foundation
- 当前专利权人地址： KR Seoul
- 代理机构： Sherr & Vaughn, PLLC
- 优先权： KR10-2008-0088683 20080909
- 主分类号： B28B7/30
- IPC分类号： B28B7/30
摘要：
An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
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