发明授权
US08252505B2 Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern
有权
化合物及其制造方法，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
- 专利标题： Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern
- 专利标题（中）： 化合物及其制造方法，酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
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申请号： US12371876申请日： 2009-02-16
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公开(公告)号： US08252505B2公开(公告)日： 2012-08-28
- 发明人: Akiya Kawaue , Keita Ishiduka , Kensuke Matsuzawa , Yoshiyuki Utsumi , Hiroaki Shimizu
- 申请人： Akiya Kawaue , Keita Ishiduka , Kensuke Matsuzawa , Yoshiyuki Utsumi , Hiroaki Shimizu
- 申请人地址： JP Kawasaki-shi
- 专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人： Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址： JP Kawasaki-shi
- 代理机构： Knobbe Martens Olson & Bear LLP
- 优先权： JP2008-036732 20080218
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C07D493/08 ; C07D495/08
摘要：
A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below: [Chemical Formula 1] A+Z− (b1-2) wherein A+ represents an organic cation; and Z− represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes part of the ester linkage is bonded directly to the ring structure, and the other group includes an anion moiety.
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