Invention Grant
- Patent Title: Pattern writing system and parameters monitoring method for pattern writing apparatus
- Patent Title (中): 模式写入系统和模式写入设备的参数监控方法
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Application No.: US12406390Application Date: 2009-03-18
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Publication No.: US08258491B2Publication Date: 2012-09-04
- Inventor: Yoshikuni Goshima
- Applicant: Yoshikuni Goshima
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-071472 20080319
- Main IPC: G21K5/00
- IPC: G21K5/00

Abstract:
A pattern writing system includes a plurality of control units configured to use different communication standards; a pattern writing unit configured to be controlled by the plurality of control units and write a pattern on a target object by using a charged particle beam; a storage unit configured to receive parameter information from an external slave computer and stores the parameter information; a first interface information circuit group configured to output a received parameter information to at least one of the plurality of control units in conformity with a communication standard on the at least one of plurality of control units; a main computer; and a second interface circuit group configured to receive a request from the main computer, input parameter information been setting in the plurality of control units without passing through the storage unit, convert communication standards of the parameter information input into a communication standard used by the main computer, and output the parameter information whose each communication standard is converted to the main computer.
Public/Granted literature
- US20090237824A1 PATTERN WRITING SYSTEM AND PARAMETERS MONITORING METHOD FOR PATTERN WRITING APPARATUS Public/Granted day:2009-09-24
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