发明授权
- 专利标题: Semiconductor devices and semiconductor apparatuses including the same
- 专利标题(中): 包括其的半导体器件和半导体器件
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申请号: US12219990申请日: 2008-07-31
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公开(公告)号: US08258542B2公开(公告)日: 2012-09-04
- 发明人: Won-joo Kim , Dae-kil Cha , Tae-hee Lee , Yoon-dong Park
- 申请人: Won-joo Kim , Dae-kil Cha , Tae-hee Lee , Yoon-dong Park
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2008-0017887 20080227
- 主分类号: H01L29/66
- IPC分类号: H01L29/66
摘要:
Semiconductor devices and semiconductor apparatuses including the same are provided. The semiconductor devices include a body region disposed on a semiconductor substrate, gate patterns disposed on the semiconductor substrate and on opposing sides of the body region, and first and second impurity doped regions disposed on an upper surface of the body region. The gate patterns may be separated from the first and second impurity doped regions by, or greater than, a desired distance, such that the gate patterns do not to overlap the first and second impurity doped regions in a direction perpendicular to the first and second impurity doped regions.
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