发明授权
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US12061735申请日: 2008-04-03
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公开(公告)号: US08258625B2公开(公告)日: 2012-09-04
- 发明人: Shinichi Fujiwara
- 申请人: Shinichi Fujiwara
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2007-100777 20070406; JP2007-299110 20071119
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
In a structure for connecting a semiconductor element having a fine pitch electrode at 50 μm pitch or less and a pad or wirings on a substrate, for preventing inter-bump short-circuit or fracture of a connected portion due to high strain generated upon heating or application of load during connection, the substrate and the semiconductor element are connected by way of a bump having a longitudinal elastic modulus (Young's modulus) of 65 GPa or more and 600 GPa or less and a buffer layer including one of tin, aluminum, indium, or lead as a main ingredient and, further, protrusions are formed to at least one of opposing surfaces of the bump and the pad or the wirings on the substrate to each other, and the surfaces are connected by ultrasonic waves.
公开/授权文献
- US20080251914A1 SEMICONDUCTOR DEVICE 公开/授权日:2008-10-16
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