发明授权
- 专利标题: Pattern shape inspection method and apparatus thereof
- 专利标题(中): 图案形状检查方法及装置
-
申请号: US12620713申请日: 2009-11-18
-
公开(公告)号: US08260029B2公开(公告)日: 2012-09-04
- 发明人: Keiya Saito , Hideaki Sasazawa , Takenori Hirose
- 申请人: Keiya Saito , Hideaki Sasazawa , Takenori Hirose
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2008-295588 20081119
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
This invention relates to a pattern shape inspection method and an apparatus thereof for conducting a first step of irradiating wideband illuminating light which contains far ultraviolet light to a sample from a perpendicular direction, inspecting a shape of the pattern based on a spectral waveform of reflecting light detected from the sample, and detecting an edge roughness of the pattern based on the spectral waveform of the reflecting light detected from the sample, and a second step of irradiating a laser beam to the sample from an oblique direction, and detecting the edge roughness of the pattern based on scattered light detected from the sample.
公开/授权文献
- US20100124370A1 PATTERN SHAPE INSPECTION METHOD AND APPARATUS THEREOF 公开/授权日:2010-05-20