发明授权
- 专利标题： Method for analyzing gait pattern
- 专利标题（中）： 步态模式分析方法
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申请号： US12969565申请日： 2010-12-15
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公开(公告)号： US08261611B2公开(公告)日： 2012-09-11
- 发明人: Min Ho Kim , Ho Youl Jung , Jae Won Jang , Sa Kwang Song , Soo Jun Park
- 申请人： Min Ho Kim , Ho Youl Jung , Jae Won Jang , Sa Kwang Song , Soo Jun Park
- 申请人地址： KR Daejeon
- 专利权人： Electronics and Telecommunications Research Institute
- 当前专利权人： Electronics and Telecommunications Research Institute
- 当前专利权人地址： KR Daejeon
- 优先权： KR10-2009-0129206 20091222
- 主分类号： A61B5/103
- IPC分类号： A61B5/103
摘要：
A method for analyzing a gait pattern includes: measuring, by a plurality of force sensing resistor (FSR) sensors, foot pressure values, and outputting the measured foot pressure values, respectively; searching for a maximum pressure local area in which the sum of the output values from the FSR sensors included in each of a plurality of pressure local areas is maximized; calculating a center of pressure (COP) with respect to the detected maximum pressure local area; and analyzing a gait pattern by adding the calculated COP to the trajectory of COPs.
公开/授权文献
- US20110146396A1 METHOD FOR ANALYZING GAIT PATTERN 公开/授权日：2011-06-23