Invention Grant
- Patent Title: Color filter and method of fabricating the same
- Patent Title (中): 滤色器及其制造方法
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Application No.: US12473678Application Date: 2009-05-28
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Publication No.: US08263194B2Publication Date: 2012-09-11
- Inventor: Pin-Chen Chen , Hui-Lung Kuo , Chih-Ho Chiu , Liang-Bin Yu
- Applicant: Pin-Chen Chen , Hui-Lung Kuo , Chih-Ho Chiu , Liang-Bin Yu
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW93141344A 20041230
- Main IPC: C09K19/00
- IPC: C09K19/00

Abstract:
A color filter having a bi-layer metal grating is formed by nanoimprint lithography. Nanoimprint lithography, a low cost technology, includes two alternatives, i.e., hot-embossing nanoimprint lithography and UV-curable nanoimprint lithography. Manufacture steps includes providing a substrate with a polymer material layer disposed thereon. A plurality of lands and grooves are formed in the polymer material layer, and a first metal layer and a second metal layer are disposed on the surfaces of the lands and grooves, respectively. Finally, a color filter having a bi-layer metal grating is obtained.
Public/Granted literature
- US20090231706A1 COLOR FILTER AND METHOD OF FABRICATING THE SAME Public/Granted day:2009-09-17
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