Invention Grant
US08263319B2 Display member exposing method and plasma display member manufacturing method
失效
显示元件曝光方法和等离子显示元件制造方法
- Patent Title: Display member exposing method and plasma display member manufacturing method
- Patent Title (中): 显示元件曝光方法和等离子显示元件制造方法
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Application No.: US11661178Application Date: 2005-08-26
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Publication No.: US08263319B2Publication Date: 2012-09-11
- Inventor: Tetsuo Uchida , Yoshiyuki Tsuji , Yuichiro Iguchi , Minori Kamada
- Applicant: Tetsuo Uchida , Yoshiyuki Tsuji , Yuichiro Iguchi , Minori Kamada
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Hamre, Schumann, Mueller & Larson, P.C
- Priority: JP2004-250103 20040830
- International Application: PCT/JP2005/015503 WO 20050826
- International Announcement: WO2006/025266 WO 20060309
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F7/00
Abstract:
A manufacturing method for a plasma display member wherein generation of defects such as interruption and short-circuit of a pattern obtained after exposure and development is suppressed and yield is improved, even when a foreign material is adhered on a photo mask or photo mask is scratched. An exposing method for a display member wherein a display member having a photosensitive layer formed on a base substrate is exposed through a photo mask having a desired pattern. The exposing method for the display member is characterized in that the photo mask and the base substrate are relatively shifted during exposure operation.
Public/Granted literature
- US20090142703A1 Display Member Exposing Method and Plasma Display Member Manufacturing Method Public/Granted day:2009-06-04
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