Invention Grant
- Patent Title: High purity fused silica with low absolute refractive index
- Patent Title (中): 具有低绝对折射率的高纯度熔融石英
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Application No.: US12644563Application Date: 2009-12-22
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Publication No.: US08263511B2Publication Date: 2012-09-11
- Inventor: Carlos Duran , Richard Michael Fiacco , Kenneth Edward Hrdina , Daniel Raymond Sempolinski
- Applicant: Carlos Duran , Richard Michael Fiacco , Kenneth Edward Hrdina , Daniel Raymond Sempolinski
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Robert P. Santandrea
- Main IPC: C03C3/06
- IPC: C03C3/06 ; C03B25/00

Abstract:
A fused silica glass article having a low absolute refractive index and low concentrations of hydroxyl groups, halogens, and metal having a low absolute refractive index. The glass article contains less than about 10 ppm protium-containing and deuterium-containing hydroxyl groups by weight and less than about 20 ppm halogens by weight. The silica glass article also has an absolute refractive index (ARI) less than or equal to 1.560820. In one embodiment, the ARI of the fused silica article is achieved by lowering the fictive temperature of the fused silica. A method of lowering the fictive temperature is also described.
Public/Granted literature
- US20100162759A1 HIGH PURITY FUSED SILICA WITH LOW ABSOLUTE REFRACTIVE INDEX Public/Granted day:2010-07-01
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