发明授权
- 专利标题: Pattern formation method for electroluminescent element
- 专利标题(中): 电致发光元件的图案形成方法
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申请号: US12693822申请日: 2010-01-26
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公开(公告)号: US08267735B2公开(公告)日: 2012-09-18
- 发明人: Nobuyuki Ito , Norihito Ito
- 申请人: Nobuyuki Ito , Norihito Ito
- 申请人地址: JP Tokyo
- 专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: JP2002-222296 20020731; JP2002-230899 20020808
- 主分类号: H01L51/00
- IPC分类号: H01L51/00
摘要:
There is provided a pattern formed object having an electroluminescent layer coating. The pattern formed object comprising a substrate, partition walls provided on the substrate, and a coating stacked on the substrate in its part between the partition walls, wherein the partition walls have a sloped liquid non-repellent surface and have a section form that, at least in the lower part of the partition wall, as the distance from the substrate increases, the size of the partition wall in a direction parallel to the substrate decreases, and in the coating, the ratio of the maximum thickness (Tmax) to the minimum thickness (Tmin), Tmax/Tmin, is not more than 130% as measured in the coating in its part between the lower ends of the partition walls adjacent to each other.
公开/授权文献
- US20100124603A1 PATTERN FORMATION METHOD FOR ELECTROLUMINESCENT ELEMENT 公开/授权日:2010-05-20
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