发明授权
- 专利标题： Method for measuring characteristic of object to be measured, structure causing diffraction phenomenon, and measuring device
- 专利标题（中）： 用于测量待测物体的特性的方法，引起衍射现象的结构和测量装置
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申请号： US13239830申请日： 2011-09-22
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公开(公告)号： US08269967B2公开(公告)日： 2012-09-18
- 发明人: Seiji Kamba , Takashi Kondo , Koji Tanaka , Kazuhiro Takigawa , Yuichi Ogawa
- 申请人： Seiji Kamba , Takashi Kondo , Koji Tanaka , Kazuhiro Takigawa , Yuichi Ogawa
- 申请人地址： JP Nagaokakyo-Shi, Kyoto-fu JP Sendai-shi, Miyagi
- 专利权人： Murata Manufacturing Co., Ltd.,National University Corporation Tohoku University
- 当前专利权人： Murata Manufacturing Co., Ltd.,National University Corporation Tohoku University
- 当前专利权人地址： JP Nagaokakyo-Shi, Kyoto-fu JP Sendai-shi, Miyagi
- 代理机构： Dickstein Shapiro LLP
- 优先权： JP2009-080107 20090327
- 主分类号： G01J3/28
- IPC分类号： G01J3/28
摘要：
A method of attaching an object to be measured to a structure causing a diffraction phenomenon; irradiating the structure to which the object to be measured is attached and which causes the diffraction phenomenon with an electromagnetic wave; detecting the electromagnetic wave scattered by the structure causing the diffraction phenomenon; and measuring a characteristic of the object to be measured from the frequency characteristic of the detected electromagnetic wave. The object to be measured is attached directly to the surface of the structure causing the diffraction phenomenon. Thus, the method for measuring the characteristic of an object to be measured exhibits an improved measurement sensitivity and high reproducibility. A structure causing a diffraction phenomenon and used for the method, and a measuring device are provided.
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