Invention Grant
- Patent Title: Bi-directional print masking
- Patent Title (中): 双向打印屏蔽
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Application No.: US12174061Application Date: 2008-07-16
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Publication No.: US08272710B2Publication Date: 2012-09-25
- Inventor: Kevin E. Spaulding , Douglas W. Couwenhoven , Richard C. Reem , Christopher Rueby
- Applicant: Kevin E. Spaulding , Douglas W. Couwenhoven , Richard C. Reem , Christopher Rueby
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent Kevin E. Spaulding
- Main IPC: B41J2/205
- IPC: B41J2/205

Abstract:
A method for reducing banding artifacts for bi-directional multi-pass printing on an inkjet printer utilizing a printhead with a plurality of ink nozzles includes defining different print masks to be used for leftward and rightward printing passes such that both the order of ink laydown and the timing between ink laydown on different passes are each substantially constant for a given horizontal position within the image, independent of the vertical position within the image; and printing an input image on the inkjet printer with the defined print masks using a bi-directional multi-pass print mode.
Public/Granted literature
- US20100013878A1 BI-DIRECTIONAL PRINT MASKING Public/Granted day:2010-01-21
Information query
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