Invention Grant
US08273533B2 Patterned spot microarray using photocatalyst and method of manufacturing the same
失效
使用光催化剂的图案斑点微阵列及其制造方法
- Patent Title: Patterned spot microarray using photocatalyst and method of manufacturing the same
- Patent Title (中): 使用光催化剂的图案斑点微阵列及其制造方法
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Application No.: US11670207Application Date: 2007-02-01
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Publication No.: US08273533B2Publication Date: 2012-09-25
- Inventor: Jong-suk Chung , Kyu-youn Hwang , Jeo-young Shim
- Applicant: Jong-suk Chung , Kyu-youn Hwang , Jeo-young Shim
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2006-0069797 20060725
- Main IPC: C12Q1/68
- IPC: C12Q1/68
Abstract:
Provided is a method of preparing a patterned spot microarray using a photocatalyst. The method comprises coating the photocatalyst on a substrate to form a photocatalyst layer, coating a composition comprising a functional group to be connected to a biomolecule on the photocatalyst layer to form an organic layer, spotting the biomolecule on the organic layer, positioning a photomask above a spot of the biomolecule; and irradiating the spot through the photomask to pattern the spot.
Public/Granted literature
- US20080124719A1 PATTERNED SPOT MICROARRAY USING PHOTOCATALYST AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2008-05-29
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