发明授权
- 专利标题: Hybrid orientation substrate with stress layer
- 专利标题(中): 混合取向基材与应力层
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申请号: US12050956申请日: 2008-03-19
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公开(公告)号: US08274115B2公开(公告)日: 2012-09-25
- 发明人: Lee Wee Teo , Chung Woh Lai , Johnny Widodo , Shyue Seng Tan , Shailendra Mishra , Zhao Lun , Yong Meng Lee , Jeffrey Chee
- 申请人: Lee Wee Teo , Chung Woh Lai , Johnny Widodo , Shyue Seng Tan , Shailendra Mishra , Zhao Lun , Yong Meng Lee , Jeffrey Chee
- 申请人地址: SG Singapore
- 专利权人: GLOBALFOUNDRIES Singapore Pte. Ltd.
- 当前专利权人: GLOBALFOUNDRIES Singapore Pte. Ltd.
- 当前专利权人地址: SG Singapore
- 代理机构: Horizon IP Pte Ltd
- 主分类号: H01L27/12
- IPC分类号: H01L27/12
摘要:
A hybrid orientation substrate includes a base substrate having a first orientation, a first surface layer having a first orientation disposed on the base substrate in a first region, and a second surface layer disposed on the base substrate in a second region. The second surface layer has an upper sub-layer having a second orientation, and a lower sub-layer between the base substrate and the upper sub-layer. The lower sub-layer having a first stress induces a second stress on the upper sub-layer.
公开/授权文献
- US20090236663A1 HYBRID ORIENTATION SUBSTRATE WITH STRESS LAYER 公开/授权日:2009-09-24
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