Invention Grant
US08276540B2 Method and system for introducing process fluid through a chamber component
失效
通过腔室部件引入工艺流体的方法和系统
- Patent Title: Method and system for introducing process fluid through a chamber component
- Patent Title (中): 通过腔室部件引入工艺流体的方法和系统
-
Application No.: US13343877Application Date: 2012-01-05
-
Publication No.: US08276540B2Publication Date: 2012-10-02
- Inventor: Lee Chen , Merritt Funk
- Applicant: Lee Chen , Merritt Funk
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306

Abstract:
A method and system for introducing a process fluid through a chamber component in a processing system is described. The chamber component comprises a chamber element having a first surface on a supply side of the chamber element and a second surface on a process side of the chamber element, wherein the process side is opposite the supply side. Furthermore, the chamber component comprises a conduit extending through the chamber element from the supply side to the process side, wherein the conduit comprises an inlet configured to receive a process fluid and an outlet configured to distribute the process fluid.
Public/Granted literature
- US20120098405A1 Method and system for introducing process fluid through a chamber component Public/Granted day:2012-04-26
Information query
IPC分类: