Invention Grant
US08277900B2 Patterning method, method of manufacturing organic field effect transistor, and method of manufacturing flexible printed circuit board 失效
图案化方法,制造有机场效应晶体管的方法以及制造柔性印刷电路板的方法

  • Patent Title: Patterning method, method of manufacturing organic field effect transistor, and method of manufacturing flexible printed circuit board
  • Patent Title (中): 图案化方法,制造有机场效应晶体管的方法以及制造柔性印刷电路板的方法
  • Application No.: US12072171
    Application Date: 2008-02-25
  • Publication No.: US08277900B2
    Publication Date: 2012-10-02
  • Inventor: Akihiro Nomoto
  • Applicant: Akihiro Nomoto
  • Applicant Address: JP Tokyo
  • Assignee: Sony Corporation
  • Current Assignee: Sony Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Wolf, Greenfield & Sacks, P.C.
  • Priority: JP2005-083456 20050323
  • Main IPC: B05D5/12
  • IPC: B05D5/12
Patterning method, method of manufacturing organic field effect transistor, and method of manufacturing flexible printed circuit board
Abstract:
In the condition where a nozzle for applying a coating liquid is disposed on the lower side of a substrate and a substrate surface controlled in wettability is faced down, the nozzle and the substrate are moved relative to each other, whereby the coating liquid is applied to a desired region of the substrate, and then the coating liquid is dried, to obtain a pattern included a dried coating layer.
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