Invention Grant
US08278021B2 Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate 有权
制造薄膜晶体管基板的方法和用于薄膜晶体管基板中的光敏组合物

Method of fabricating a thin film transistor substrate and a photosensitive composition used in the thin film transistor substrate
Abstract:
Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.
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