发明授权
US08278139B2 Passivating glue layer to improve amorphous carbon to metal adhesion
有权
钝化胶层以改善无定形碳与金属的附着力
- 专利标题: Passivating glue layer to improve amorphous carbon to metal adhesion
- 专利标题(中): 钝化胶层以改善无定形碳与金属的附着力
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申请号: US12566948申请日: 2009-09-25
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公开(公告)号: US08278139B2公开(公告)日: 2012-10-02
- 发明人: Siu F. Cheng , Deenesh Padhi
- 申请人: Siu F. Cheng , Deenesh Padhi
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patterson & Sheridan, LLP
- 主分类号: H01L21/02
- IPC分类号: H01L21/02
摘要:
A method and apparatus is provided for forming a resistive memory device having good adhesion among the components thereof. A first conductive layer is formed on a substrate, and the surface of the first conductive layer is treated to add adhesion promoting materials to the surface. The adhesion promoting materials may form a layer on the surface, or they may incorporate into the surface or merely passivate the surface of the first conductive layer. A variable resistance layer is formed on the treated surface, and a second conductive layer is formed on the variable resistance layer. Adhesion promoting materials may also be included at the interface between the variable resistance layer and the second conductive layer.
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