Invention Grant
- Patent Title: Controlling electromechanical behavior of structures within a microelectromechanical systems device
- Patent Title (中): 控制微机电系统设备内结构的机电行为
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Application No.: US12861778Application Date: 2010-08-23
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Publication No.: US08278726B2Publication Date: 2012-10-02
- Inventor: Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
- Applicant: Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM MEMS Technologies, Inc.
- Current Assignee: QUALCOMM MEMS Technologies, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Knobbe Martens Olson & Bear LLP
- Main IPC: H01L29/84
- IPC: H01L29/84
Abstract:
In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
Public/Granted literature
- US20100320555A1 CONTROLLING ELECTROMECHANICAL BEHAVIOR OF STRUCTURES WITHIN A MICROELECTROMECHANICAL SYSTEMS DEVICE Public/Granted day:2010-12-23
Information query
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