发明授权
- 专利标题： Controlling electromechanical behavior of structures within a microelectromechanical systems device
- 专利标题（中）： 控制微机电系统设备内结构的机电行为
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申请号： US12861778申请日： 2010-08-23
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公开(公告)号： US08278726B2公开(公告)日： 2012-10-02
- 发明人: Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
- 申请人： Mark W. Miles , John Batey , Clarence Chui , Manish Kothari , Ming-Hau Tung
- 申请人地址： US CA San Diego
- 专利权人： QUALCOMM MEMS Technologies, Inc.
- 当前专利权人： QUALCOMM MEMS Technologies, Inc.
- 当前专利权人地址： US CA San Diego
- 代理机构： Knobbe Martens Olson & Bear LLP
- 主分类号： H01L29/84
- IPC分类号： H01L29/84
摘要：
In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.
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