Invention Grant
- Patent Title: Radiofrequency plasma generation device
- Patent Title (中): 射频等离子体发生装置
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Application No.: US12445636Application Date: 2007-07-03
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Publication No.: US08278807B2Publication Date: 2012-10-02
- Inventor: Andre Agneray , Marc Pariente
- Applicant: Andre Agneray , Marc Pariente
- Applicant Address: FR Boulogne Billancourt
- Assignee: Renault S.A.S.
- Current Assignee: Renault S.A.S.
- Current Assignee Address: FR Boulogne Billancourt
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR0609081 20061017
- International Application: PCT/FR2007/051582 WO 20070703
- International Announcement: WO2008/047013 WO 20080424
- Main IPC: F02M57/06
- IPC: F02M57/06 ; H05H1/24

Abstract:
A device including two plasma generation electrodes, a series resonator having a resonant frequency above 1 MHz and including a capacitor with two terminals, and an induction coil surrounded by a screen, the capacitor and the coil being placed in series, the electrodes being connected to the respective terminals of the capacitor. The ratio of the spark plug to the radius of the screen is equal to 0.56. The device can optimize the Q-factor of such a device by adjusting the radius of the coil to that of the screen.
Public/Granted literature
- US20100187999A1 RADIOFREQUENCY PLASMA GENERATION DEVICE Public/Granted day:2010-07-29
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