发明授权
- 专利标题: Microelectromechanical system diaphragm and fabricating method thereof
- 专利标题(中): 微机电系统隔膜及其制造方法
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申请号: US12196016申请日: 2008-08-21
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公开(公告)号: US08280097B2公开(公告)日: 2012-10-02
- 发明人: Ming-I Wang
- 申请人: Ming-I Wang
- 申请人地址: TW Hsinchu
- 专利权人: United Microelectronics Corp.
- 当前专利权人: United Microelectronics Corp.
- 当前专利权人地址: TW Hsinchu
- 代理商 Ding Yu Tan
- 主分类号: H04R7/14
- IPC分类号: H04R7/14
摘要:
A microelectromechanical system diaphragm is provided. The microelectromechanical system diaphragm includes a substrate, a first conductive layer, a second conductive layer, a first dielectric layer, and a second dielectric layer. The first conductive layer is disposed on the substrate. The first conductive layer has a flexible portion in which a plurality of trenches is formed. The second conductive layer is disposed between the first conductive layer and the substrate, in which the flexible portion is located above the second conductive layer. The first dielectric layer is disposed between the second conductive layer and the substrate. The second dielectric layer is disposed between the substrate and a portion of the first conductive layer so as to suspend the flexible portion. Furthermore, at least one first opening is formed in the first conductive layer.
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