Invention Grant
- Patent Title: Micro electro mechanical system device and method of manufacturing the same
- Patent Title (中): 微机电系统装置及其制造方法
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Application No.: US12058946Application Date: 2008-03-31
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Publication No.: US08282196B2Publication Date: 2012-10-09
- Inventor: Il Woo Kim , Byung Ha Park , Moon Chul Lee , Dong Sik Shim , Kyong Il Kim
- Applicant: Il Woo Kim , Byung Ha Park , Moon Chul Lee , Dong Sik Shim , Kyong Il Kim
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Stanzione & Kim, LLP
- Priority: KR10-2007-0047961 20070517
- Main IPC: B41J2/05
- IPC: B41J2/05

Abstract:
A MEMS (Micro Electro Mechanical System) device and a method of manufacturing the same, in which an detection indicator is formed on a chamber layer stacked on a substrate such that a user easily inspects whether the chamber layer has a required thickness. The MEMS device can include two detection indicators that are formed on the chamber layer and have different depth from each other, or an detection indicator which is formed on the chamber layer and has a tapered sectional shape in which an upper surface of the detection indicator is gradually narrowed in a downward direction such that a user can easily inspect whether the chamber layer has a required thickness. The user can precisely determine whether the chamber layer is planarized to a required thickness by planarizing the detection indicator formed on the chamber layer, and inspecting the detection indicator by using an optical microscope, thereby facilitating inspection for a thickness of the chamber layer.
Public/Granted literature
- US20080283495A1 MICRO ELECTRO MECHANICAL SYSTEM DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2008-11-20
Information query
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