发明授权
- 专利标题: Electrostatic chuck device
- 专利标题(中): 静电吸盘装置
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申请号: US11835743申请日: 2007-08-08
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公开(公告)号: US08284538B2公开(公告)日: 2012-10-09
- 发明人: Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura , Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
- 申请人: Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura , Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
- 申请人地址: JP JP
- 专利权人: Tokyo Electron Limited,Sumitomo Osaka Cement Co., Ltd.
- 当前专利权人: Tokyo Electron Limited,Sumitomo Osaka Cement Co., Ltd.
- 当前专利权人地址: JP JP
- 代理机构: Ostrolenk Faber LLP
- 优先权: JP2006-218447 20060810
- 主分类号: H01L21/687
- IPC分类号: H01L21/687
摘要:
An electrostatic chuck device includes an electrostatic chuck section, a metal base section, and a dielectric plate. The electrostatic chuck section has a substrate, a main surface of which serves as a mounting surface for a plate-like sample, an electrostatic-adsorption inner electrode built in the substrate, and a power supply terminal for applying a DC voltage to the electrostatic-adsorption inner electrode. Here, a dielectric plate is fixed to a concave portion formed in the metal base section. The dielectric plate and the electrostatic chuck section are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric plate and the concave portion are adhesively bonded to each other with a conductive adhesive bonding layer interposed therebetween, the volume resistivity of which is 1.0×10−2 Ωcm or less.
公开/授权文献
- US20080062611A1 ELECTROSTATIC CHUCK DEVICE 公开/授权日:2008-03-13
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