发明授权
- 专利标题: Apparatus and method for manufacturing light source
- 专利标题(中): 光源制造装置及方法
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申请号: US12852281申请日: 2010-08-06
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公开(公告)号: US08284806B2公开(公告)日: 2012-10-09
- 发明人: Kazutaka Ikeda , Shinichi Oe , Akira Nakamura , Motoaki Tamaya
- 申请人: Kazutaka Ikeda , Shinichi Oe , Akira Nakamura , Motoaki Tamaya
- 申请人地址: JP Chiyoda-Ku, Tokyo
- 专利权人: Mitsubishi Electric Corporation
- 当前专利权人: Mitsubishi Electric Corporation
- 当前专利权人地址: JP Chiyoda-Ku, Tokyo
- 代理机构: Buchanan Ingersoll & Rooney PC
- 优先权: JP2009-268681 20091126
- 主分类号: H01S3/10
- IPC分类号: H01S3/10
摘要:
Because a reflector that reflects a fundamental wave generated from a solid-state laser element and forms an optical resonator is disposed on an exit surface of a wavelength conversion element, the fundamental wave cannot be resonated and amplified in a stage before the wavelength conversion element is joined to the solid-state laser element. As a result, a problem is created in that the solid-state laser element emits low level light output, so that a relative position of the semiconductor laser and the solid-state laser element cannot properly be adjusted. In order to overcome the above problem, even in the stage before joining the wavelength conversion element to the solid-state laser element, the invention enables the semiconductor laser and the solid-state laser element to be joined by properly adjusting the relative position of the laser and the laser element. A second reflector is provided that is located opposite a first reflector of the solid-state laser element and that partially transmits through the fundamental wave emitted from the solid-state laser element and reflects the rest of the wave. The semiconductor laser and the solid-state laser element are joined together at a relative position such that the output of light having passed through the second reflector reaches or exceeds a predetermined value.
公开/授权文献
- US20110122898A1 APPARATUS AND METHOD FOR MANUFACTURING LIGHT SOURCE 公开/授权日:2011-05-26
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